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International Journal of Applied Research
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ISSN Print: 2394-7500, ISSN Online: 2394-5869, CODEN: IJARPF

g-index: 90

Vol. 1, Issue 10, Part E (2015)

Quarter wave optical thin film deposition and optical characterization of film

Quarter wave optical thin film deposition and optical characterization of film

Author(s)
Sunil Kumar
Abstract
Thin film technology is very high usable in day to day life and small scientific application to very high technology. According to use of thin films; films are made of different materials like metallic thin film and dielectric material thin films. In semiconductor technology, solar cells; films of some compound semiconductor are formed. Dielectric thin films are used in various types of application from simple mirror to laser mirror and laser windows. Very interesting application of dielectric mirror in making head up display. Thin films formation has primary condition that it required very high vacuum. At particular vacuum level it works and desirable features of the thin film are achieved, otherwise impurity and other defects are occurring in the film. X-ray diffraction, Uv-Visible spectroscopy and FTIR is taken for characterization of film. From these amorphous, high reflective and antireflective and absorptive films are formed.
Pages: 348-350  |  991 Views  101 Downloads


International Journal of Applied Research
How to cite this article:
Sunil Kumar. Quarter wave optical thin film deposition and optical characterization of film. Int J Appl Res 2015;1(10):348-350.
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