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International Journal of Applied Research
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ISSN Print: 2394-7500, ISSN Online: 2394-5869, CODEN: IJARPF

TCR (Google Scholar): 4.11, TCR (Crossref): 13, g-index: 90

Peer Reviewed Journal

Vol. 11, Issue 3, Part E (2025)

Optimization on the mechanical properties of epoxidized natural rubber (ENR25 & ENR50) B Bisphenol A/amine-based compounds for the development of new ENR-Adhesive Systems

Optimization on the mechanical properties of epoxidized natural rubber (ENR25 & ENR50) B Bisphenol A/amine-based compounds for the development of new ENR-Adhesive Systems

Author(s)
Amina Hassan Bayero, Umaru Semo Ishiaku, Abdullahi Adamu Kogo, Hamza Abba, Oladiran Fatai Olashina and Mary Lawan
Abstract

Epoxidized natural rubber (ENR25 & ENR50) bisphenol A/amine-based compounds were prepared through a compounding process by using a two-roll mill and compression moulding machine. Two different amines systems (Hexamethylenediamine and p-phenylenediamine) were used for the optimization process at varying ratios of the ENR: Amines and ENR:BPA from 1:1, 1:2, 1:4, 1:6 and 1:8 corresponding 5,10,15,20,25 phr of the BPA and Amines. The produced ENR-BPA/Amine systems were compared with those of the convensional ENR-Sulphur cured systems. The evaluation of some mechanical properties were carried out on the compounds such as tensile strength, abrasion resistant, hardness tests. Results obtained gave optimal values for tensile strength, modulus, abrasion resistance and hardness at 15 phr loadings for both amines (HMDA and PPD) used, The optimum results obtained were then used to develop a standard formulation and produced a new ENR-amine based adhesive system.

Pages: 345-350  |  120 Views  58 Downloads


International Journal of Applied Research
How to cite this article:
Amina Hassan Bayero, Umaru Semo Ishiaku, Abdullahi Adamu Kogo, Hamza Abba, Oladiran Fatai Olashina, Mary Lawan. Optimization on the mechanical properties of epoxidized natural rubber (ENR25 & ENR50) B Bisphenol A/amine-based compounds for the development of new ENR-Adhesive Systems. Int J Appl Res 2025;11(3):345-350. DOI: 10.22271/allresearch.2025.v11.i3e.12442
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