Vol. 3, Issue 7, Part S (2017)
Third order perturbed Heisenberg Hamiltonian explanation of axis of ferromagnetic films
Third order perturbed Heisenberg Hamiltonian explanation of axis of ferromagnetic films
Author(s)
Shad Husain and Bhuvan Bhasker Srivastava
Abstract
Properties of ferromagnetic thin films depend on the composition of target materials, chamber pressure, type of chamber gas, separation between target and substrate, deposition rate and annealing conditions. The third order perturbed Heisenberg Hamiltonian has been applied to explain the magnetic easy axis orientation. Ferromagnetic CoPt/AlN multilayer thin films with on fused quartz substrates using dc magnetron sputtering technique have been employed as experimental data. The easy axis of these FCC structured ferromagnetic films is oriented in the plane of the film above one particular temperature. Average value of out of plane spin component was plotted against temperature in order to determine the spin reorientation temperature.
How to cite this article:
Shad Husain, Bhuvan Bhasker Srivastava. Third order perturbed Heisenberg Hamiltonian explanation of axis of ferromagnetic films. Int J Appl Res 2017;3(7):1458-1461.